Deposition Chamber with Linear Transfer Loadlock
Metal Organic
Chemical Vapor Deposition
(MOCVD) Systems
MOCVD Product Specification
| SYSTEM | MOCVD |
| MATERIAL TYPE | AsP, GaN, II/VI, SiC |
| ENVELOPE | 16'L x 4'W x 7'H |
| FACILITIES | |
|---|---|
| Power | 208VAC; 50/60 Hz; 100A |
| Water | 80 psig; 10g/min |
| Ventilation | 1200 cuft/min |
- ELECTRONICS CONSOLE
- Device Net Protocol
- PLC/Computer MMI
- Touch Screen Monitor
- Closed Loop Optical Pyrometry
- 15 KW Power Supply
- GAS PROCESSING
- 12 Alkyls (Bubblers)
- 8 Hydrides/Dopants
- 2 Carrier Gases (N2, H2)
- Source Concentration Monitoring
- Point of use Purification Available
- REACTOR & GLOVEBOX
- High Efficiency Design (low gas usage)
- 75 to 200 mm platter Capable
- Radiant Heating
- Water Cooling (of high temp. surfaces)
- Inert Atmosphere Glove Box (Nitrogen)
- EXHAUST & ABATEMENT
- Dry Process Pump
- Regenerable Abatement
Valence Process Equipment, Inc.
180 Quaker Lane, Suite B, Malvern, PA 19355
Phone: 610-647-1005 | Fax: 610-640-4809
E-mail contact: sales@valenceprocess.com
Copyright © 2008, Valence Process Equipment. All Rights Reserved.